@ARTICLE{Kurjata2025:i8480,
	author="{Kurjata, Jan and Walkiewicz-Pietrzykowska, Agnieszka and Jankowski, Krzyztof and Dolot, Rafał and Brzozowski, Romuald and Zakrzewska, Joanna and Uznański, Paweł}",
	title="{Silicon Oxycarbide Thin Films Produced by Hydrogen-Induced CVD Process from Cyclic Dioxa-Tetrasilacyclohexane}",
	year="2025",
	type="artykuł naukowy",
	language="en",
	journal="{Materials}",
	issn="1996-1944",
	volume="18",
	number="12",
	pages="2911(1)--2911(25)",
	doi="10.3390/ma18122911",
	url="https://www.mdpi.com/1996-1944/18/12/2911",
	keywords="microwave remote hydrogen plasma; chemical vapor deposition; octamethyl-1,4-dioxatetrasilacyclohexane; poly(oxybisdimethylsilylene); SiOC films; preceramic material",
}