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Main page / Publications / Silicon Oxycarbide Thin Films Produced by Hydrogen-Induced CVD Process from Cyclic Dioxa-Tetrasilacyclohexane
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Article

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Title

Silicon Oxycarbide Thin Films Produced by Hydrogen-Induced CVD Process from Cyclic Dioxa-Tetrasilacyclohexane

Authors

[ 1 ] Instytut Nanotechnologii i Nanobiologii, Akademia im. Jakuba z Paradyża | [ 2 ] Wydział Nauk o Zdrowiu, Akademia im. Jakuba z Paradyża | [ P ] employee

Scientific discipline (Law 2.0)

[6.3] Security studies

Year of publication

2025

Published in

Materials

Journal year: 2025 | Journal volume: 18 | Journal number: 12

Article type

scientific article

Publication language

english

Keywords
EN
  • microwave remote hydrogen plasma
  • chemical vapor deposition
  • octamethyl-1,4-dioxatetrasilacyclohexane
  • poly(oxybisdimethylsilylene)
  • SiOC films
  • preceramic material
Pages (from - to)

2911(1) - 2911(25)

DOI

10.3390/ma18122911

URL

https://www.mdpi.com/1996-1944/18/12/2911

License type

CC BY (attribution alone)

Open Access Mode

open journal

Open Access Text Version

final published version

Release date

06.2025

Date of Open Access to the publication

at the time of publication

Ministry points / journal

140

Financing
Project
Project "Open Resources in the Digital Repository of Scientific Institutes" [OZwRCIN] co-financed by the European Regional Development Fund under the Operational Program Digital Poland, 2014-2020, task 2.3: Digital accessibility and usefulness of the public sector and Partner funds
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Partner funds
Works related to making new objects available on the RCIN website are also co-financed by the Partners.
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